Exploitation of the Menshutkin Reaction for the Controlled Assembly of Halogen Bonded Architectures Incorporating 1,2-Diiodotetrafluorobenzene and 1,3,5-Triiodotrifluorobenzene
Authors of publication
Pfrunder, Michael C.; Micallef, Aaron S.; Rintoul, Llewellyn; Arnold, Dennis P.; Davy, Karl J. P.; McMurtrie, John
Journal of publication
Crystal Growth & Design
Year of publication
2012
Journal volume
12
Journal issue
2
Pages of publication
714
a
12.3666 ± 0.0004 Å
b
12.5432 ± 0.0004 Å
c
14.0845 ± 0.0004 Å
α
83.083 ± 0.002°
β
72.525 ± 0.003°
γ
60.817 ± 0.003°
Cell volume
1818.51 ± 0.12 Å3
Cell temperature
173 ± 2 K
Ambient diffraction temperature
173 ± 2 K
Number of distinct elements
6
Space group number
2
Hermann-Mauguin space group symbol
P -1
Hall space group symbol
-P 1
Residual factor for all reflections
0.0389
Residual factor for significantly intense reflections
0.0249
Weighted residual factors for significantly intense reflections
0.0402
Weighted residual factors for all reflections included in the refinement
0.0415
Goodness-of-fit parameter for all reflections included in the refinement
