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Information card for entry 4502870
Preview
Coordinates | 4502870.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C34 H43 Cl9 F6 I6 N6 |
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Calculated formula | C34 H43 Cl9 F6 I6 N6 |
SMILES | c1(c(c(c(c(c1F)I)F)I)F)I.c1(c(c(c(c(c1F)I)F)I)F)I.C([N+]12CCN(CC1)CC2)Cl.C([N+]12CCN(CC1)CC2)Cl.C([N+]12CCN(CC1)CC2)Cl.C(Cl)(Cl)Cl.[Cl-].[Cl-].[Cl-] |
Title of publication | Exploitation of the Menshutkin Reaction for the Controlled Assembly of Halogen Bonded Architectures Incorporating 1,2-Diiodotetrafluorobenzene and 1,3,5-Triiodotrifluorobenzene |
Authors of publication | Pfrunder, Michael C.; Micallef, Aaron S.; Rintoul, Llewellyn; Arnold, Dennis P.; Davy, Karl J. P.; McMurtrie, John |
Journal of publication | Crystal Growth & Design |
Year of publication | 2012 |
Journal volume | 12 |
Journal issue | 2 |
Pages of publication | 714 |
a | 20.2337 ± 0.0009 Å |
b | 12.6399 ± 0.0004 Å |
c | 22.2082 ± 0.0008 Å |
α | 90° |
β | 110.871 ± 0.005° |
γ | 90° |
Cell volume | 5307.1 ± 0.4 Å3 |
Cell temperature | 173 ± 2 K |
Ambient diffraction temperature | 173 ± 2 K |
Number of distinct elements | 6 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/c 1 |
Hall space group symbol | -P 2ybc |
Residual factor for all reflections | 0.0513 |
Residual factor for significantly intense reflections | 0.0343 |
Weighted residual factors for significantly intense reflections | 0.0725 |
Weighted residual factors for all reflections included in the refinement | 0.0753 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.08 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4502870.html
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Users of the data should acknowledge the original authors of the
structural data.