Exploitation of the Menshutkin Reaction for the Controlled Assembly of Halogen Bonded Architectures Incorporating 1,2-Diiodotetrafluorobenzene and 1,3,5-Triiodotrifluorobenzene
Authors of publication
Pfrunder, Michael C.; Micallef, Aaron S.; Rintoul, Llewellyn; Arnold, Dennis P.; Davy, Karl J. P.; McMurtrie, John
Journal of publication
Crystal Growth & Design
Year of publication
2012
Journal volume
12
Journal issue
2
Pages of publication
714
a
20.2571 ± 0.0003 Å
b
20.2571 ± 0.0003 Å
c
25.549 ± 0.0006 Å
α
90°
β
90°
γ
120°
Cell volume
9079.4 ± 0.3 Å3
Cell temperature
173 ± 2 K
Ambient diffraction temperature
173 ± 2 K
Number of distinct elements
6
Space group number
167
Hermann-Mauguin space group symbol
R -3 c :H
Hall space group symbol
-R 3 2"c
Residual factor for all reflections
0.0554
Residual factor for significantly intense reflections
0.0305
Weighted residual factors for significantly intense reflections
0.0676
Weighted residual factors for all reflections included in the refinement
0.0713
Goodness-of-fit parameter for all reflections included in the refinement
