Information card for entry 4506886
| Formula |
C127 H280 N32 Zr4 |
| Calculated formula |
C127 H280 N32 Zr4 |
| Title of publication |
Fabrication of ZrO2and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors |
| Authors of publication |
Banerjee, Manish; Srinivasan, Nagendra Babu; Zhu, Huaizhi; Kim, Sun Ja; Xu, Ke; Winter, Manuela; Becker, Hans-Werner; Rogalla, Detlef; de los Arcos, Teresa; Bekermann, Daniela; Barreca, Davide; Fischer, Roland A.; Devi, Anjana |
| Journal of publication |
Crystal Growth & Design |
| Year of publication |
2012 |
| Journal volume |
12 |
| Journal issue |
10 |
| Pages of publication |
5079 |
| a |
10.5241 ± 0.0004 Å |
| b |
38.9877 ± 0.0014 Å |
| c |
18.2981 ± 0.0008 Å |
| α |
90° |
| β |
95.285 ± 0.004° |
| γ |
90° |
| Cell volume |
7476 ± 0.5 Å3 |
| Cell temperature |
111 ± 2 K |
| Ambient diffraction temperature |
111 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/c 1 |
| Hall space group symbol |
-P 2ybc |
| Residual factor for all reflections |
0.0905 |
| Residual factor for significantly intense reflections |
0.0511 |
| Weighted residual factors for significantly intense reflections |
0.1013 |
| Weighted residual factors for all reflections included in the refinement |
0.1176 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.028 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
Yes |
| Has Fobs |
No |
For the version history of this entry, please navigate to main COD server.
The link is:
https://www.crystallography.net/4506886.html