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Information card for entry 4516603
Preview
Coordinates | 4516603.cif |
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Original paper (by DOI) | HTML |
Formula | C72 H94 N8 O4 Si |
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Calculated formula | C72 H94 N8 O4 Si |
SMILES | [Si]123(n4c5=Nc6[n]3c(=Nc3c7c(c(N=c8[n]2c(N=c4c2c5cccc2)c2c8cccc2)n13)cccc7)c1c6cccc1)(OC(=O)CCCCCCCCCCCCCCCCCCC)OC(=O)CCCCCCCCCCCCCCCCCCC |
Title of publication | Solution-Processable Silicon Phthalocyanines in Electroluminescent and Photovoltaic Devices. |
Authors of publication | Zysman-Colman, Eli; Ghosh, Sanjay S.; Xie, Guohua; Varghese, Shinto; Chowdhury, Mithun; Sharma, Nidhi; Cordes, David B.; Slawin, Alexandra M. Z.; Samuel, Ifor D. W. |
Journal of publication | ACS applied materials & interfaces |
Year of publication | 2016 |
Journal volume | 8 |
Journal issue | 14 |
Pages of publication | 9247 - 9253 |
a | 9.1436 ± 0.0015 Å |
b | 12.0015 ± 0.0017 Å |
c | 15.84 ± 0.003 Å |
α | 67.934 ± 0.009° |
β | 82.349 ± 0.012° |
γ | 77.354 ± 0.012° |
Cell volume | 1569.3 ± 0.5 Å3 |
Cell temperature | 93 K |
Ambient diffraction temperature | 93 K |
Number of distinct elements | 5 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.055 |
Residual factor for significantly intense reflections | 0.0396 |
Weighted residual factors for significantly intense reflections | 0.1031 |
Weighted residual factors for all reflections included in the refinement | 0.1107 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.011 |
Diffraction radiation wavelength | 0.71075 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4516603.html
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