Information card for entry 7006841

Structure parameters

• Common name: ((K(thf)3Si(NCH2tBu)2C6H4)2)
• Formula: C56 H100 K2 N4 O6 Si2
• Calculated formula: C56.002 H100.004 K2 N4 O6 Si2
• Title of publication: Insights into the making of a stable silylene.
• Authors of publication: Gehrhus, Barbara; Hitchcock, Peter B.; Pongtavornpinyo, Ruti; Zhang, Lihong
• Journal of publication: Dalton transactions (Cambridge, England : 2003)
• Year of publication: 2006
• Journal issue: 15
• Pages of publication: 1847 - 1857
• a: 15.0808 ± 0.0002 Å
• b: 20.3241 ± 0.0002 Å
• c: 20.7401 ± 0.0002 Å
• α: 90°
• β: 90°
• γ: 90°
• Cell volume: 6356.92 ± 0.12 ų
• Cell temperature: 173 ± 2 K
• Ambient diffraction temperature: 173 ± 2 K
• Number of distinct elements: 6
• Space group number: 19
• Hermann-Mauguin space group symbol: P 21 21 21
• Hall space group symbol: P 2ac 2ab
• Residual factor for all reflections: 0.0634
• Residual factor for significantly intense reflections: 0.0503
• Weighted residual factors for significantly intense reflections: 0.1248
• Weighted residual factors for all reflections included in the refinement: 0.1342
• Goodness-of-fit parameter for all reflections included in the refinement: 1.047
• Diffraction radiation probe: x-ray
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: Yes
• Has Fobs: No