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Information card for entry 7012282
Preview
Coordinates | 7012282.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C24 H76 Li4 N16 Si4 |
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Calculated formula | C24 H76 Li4 N16 Si4 |
SMILES | [Li]123[N](C)(C)[Si](N(C)C)(N(C)C)[NH]1[Li]1[NH]45[Si](N(C)C)(N(C)C)[N](C)(C)[Li]46[N](C)(C)[Si](N(C)C)(N(C)C)[NH]6[Li]5[NH]12[Si](N(C)C)(N(C)C)[N]3(C)C |
Title of publication | Syntheses and structures of [(Me3N)3SiNHLi]4, (C4H8O)Al[NHSi(NMe2)3]3, ((Me2N)3SiNH)3Al and Li(THF)2+[((Me2N)3SiNH)4Al]‒ |
Authors of publication | Bradley, John S.; Cheng, Fei; Archibald, Stephen J.; Supplit, Ralf; Rovai, Riccardo; Lehmann, Christian W.; Krüger, Carl; Lefebvre, Frédéric |
Journal of publication | Dalton Transactions |
Year of publication | 2003 |
Journal issue | 9 |
Pages of publication | 1846 |
a | 11.567 ± 0.0005 Å |
b | 8.9071 ± 0.0008 Å |
c | 22.3754 ± 0.0016 Å |
α | 90° |
β | 96.861 ± 0.005° |
γ | 90° |
Cell volume | 2288.8 ± 0.3 Å3 |
Cell temperature | 293 K |
Ambient diffraction temperature | 293 K |
Number of distinct elements | 5 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/n 1 |
Hall space group symbol | -P 2yn |
Residual factor for all reflections | 0.1224 |
Residual factor for significantly intense reflections | 0.0487 |
Weighted residual factors for significantly intense reflections | 0.1429 |
Weighted residual factors for all reflections included in the refinement | 0.1805 |
Goodness-of-fit parameter for all reflections included in the refinement | 0.975 |
Diffraction radiation wavelength | 0.71069 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/7012282.html
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Users of the data should acknowledge the original authors of the
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