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Information card for entry 7014997
Preview
| Coordinates | 7014997.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Common name | (iPr2Im)1(SiHPh2)2Ni(ii) |
|---|---|
| Chemical name | (iPr2Im)1(SiHPh2)2Ni(II) |
| Formula | C34 H56 N4 Ni O Si2 |
| Calculated formula | C34 H56 N4 Ni O Si2 |
| SMILES | [Ni]([SiH2]c1ccccc1)([SiH2]c1ccccc1)(=C1N(C=CN1C(C)C)C(C)C)=C1N(C=CN1C(C)C)C(C)C.O(CC)CC |
| Title of publication | Si-H Activation of hydrosilanes leading to hydrido silyl and bis(silyl) nickel complexes. |
| Authors of publication | Zell, Thomas; Schaub, Thomas; Radacki, Krzysztof; Radius, Udo |
| Journal of publication | Dalton transactions (Cambridge, England : 2003) |
| Year of publication | 2011 |
| Journal volume | 40 |
| Journal issue | 9 |
| Pages of publication | 1852 - 1854 |
| a | 10.608 ± 0.002 Å |
| b | 10.799 ± 0.002 Å |
| c | 32.098 ± 0.006 Å |
| α | 90° |
| β | 96.47 ± 0.03° |
| γ | 90° |
| Cell volume | 3653.6 ± 1.2 Å3 |
| Cell temperature | 203 ± 2 K |
| Ambient diffraction temperature | 203 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/c 1 |
| Hall space group symbol | -P 2ybc |
| Residual factor for all reflections | 0.0731 |
| Residual factor for significantly intense reflections | 0.056 |
| Weighted residual factors for significantly intense reflections | 0.151 |
| Weighted residual factors for all reflections included in the refinement | 0.1787 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.142 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/7014997.html
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Users of the data should acknowledge the original authors of the
structural data.