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Information card for entry 7014997
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Coordinates | 7014997.cif |
---|---|
Original paper (by DOI) | HTML |
Common name | (iPr2Im)1(SiHPh2)2Ni(ii) |
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Chemical name | (iPr2Im)1(SiHPh2)2Ni(II) |
Formula | C34 H56 N4 Ni O Si2 |
Calculated formula | C34 H56 N4 Ni O Si2 |
SMILES | [Ni]([SiH2]c1ccccc1)([SiH2]c1ccccc1)(=C1N(C=CN1C(C)C)C(C)C)=C1N(C=CN1C(C)C)C(C)C.O(CC)CC |
Title of publication | Si-H Activation of hydrosilanes leading to hydrido silyl and bis(silyl) nickel complexes. |
Authors of publication | Zell, Thomas; Schaub, Thomas; Radacki, Krzysztof; Radius, Udo |
Journal of publication | Dalton transactions (Cambridge, England : 2003) |
Year of publication | 2011 |
Journal volume | 40 |
Journal issue | 9 |
Pages of publication | 1852 - 1854 |
a | 10.608 ± 0.002 Å |
b | 10.799 ± 0.002 Å |
c | 32.098 ± 0.006 Å |
α | 90° |
β | 96.47 ± 0.03° |
γ | 90° |
Cell volume | 3653.6 ± 1.2 Å3 |
Cell temperature | 203 ± 2 K |
Ambient diffraction temperature | 203 ± 2 K |
Number of distinct elements | 6 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/c 1 |
Hall space group symbol | -P 2ybc |
Residual factor for all reflections | 0.0731 |
Residual factor for significantly intense reflections | 0.056 |
Weighted residual factors for significantly intense reflections | 0.151 |
Weighted residual factors for all reflections included in the refinement | 0.1787 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.142 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/7014997.html
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