Information card for entry 7023135
| Common name |
In(di-i-Pr-dithiocarbamate)3.1.5 |
| Formula |
C28.5 H49.5 In N4.5 S6 |
| Calculated formula |
C28.5 H49.5 In N4.5 S6 |
| Title of publication |
Development of molecular precursors for deposition of indium sulphide thin film electrodes for photoelectrochemical applications. |
| Authors of publication |
Ehsan, Muhammad Ali; Peiris, T. A. Nirmal; Wijayantha, K. G. Upul; Olmstead, Marilyn M.; Arifin, Zainudin; Mazhar, Muhammad; Lo, K. M.; McKee, Vickie |
| Journal of publication |
Dalton transactions (Cambridge, England : 2003) |
| Year of publication |
2013 |
| Journal volume |
42 |
| Journal issue |
30 |
| Pages of publication |
10919 - 10928 |
| a |
11.6384 ± 0.0004 Å |
| b |
11.9426 ± 0.0004 Å |
| c |
14.4945 ± 0.0003 Å |
| α |
92.781 ± 0.002° |
| β |
102.078 ± 0.002° |
| γ |
111.637 ± 0.003° |
| Cell volume |
1813.64 ± 0.11 Å3 |
| Cell temperature |
100 ± 2 K |
| Ambient diffraction temperature |
100 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.0272 |
| Residual factor for significantly intense reflections |
0.0219 |
| Weighted residual factors for significantly intense reflections |
0.0502 |
| Weighted residual factors for all reflections included in the refinement |
0.0515 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.06 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
Yes |
| Has Fobs |
No |
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https://www.crystallography.net/7023135.html