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Information card for entry 7026430
Preview
| Coordinates | 7026430.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C22 H58 Ni P2 Si5 |
|---|---|
| Calculated formula | C22 H58 Ni P2 Si5 |
| SMILES | [Si]1(C(CCC1([Si](C)(C)C)[Si](C)(C)C)([Si](C)(C)C)[Si](C)(C)C)=[Ni]([P](C)(C)C)[P](C)(C)C |
| Title of publication | Synthesis and structures of (dialkylsilylene)bis(phosphine)-nickel, palladium, and platinum complexes and (η(6)-arene)(dialkylsilylene)nickel complexes. |
| Authors of publication | Watanabe, Chieko; Inagawa, Yuichiro; Iwamoto, Takeaki; Kira, Mitsuo |
| Journal of publication | Dalton transactions (Cambridge, England : 2003) |
| Year of publication | 2010 |
| Journal volume | 39 |
| Journal issue | 39 |
| Pages of publication | 9414 - 9420 |
| a | 9.476 ± 0.003 Å |
| b | 32.504 ± 0.009 Å |
| c | 11.672 ± 0.003 Å |
| α | 90° |
| β | 112.327 ± 0.003° |
| γ | 90° |
| Cell volume | 3325.5 ± 1.6 Å3 |
| Cell temperature | 100 K |
| Ambient diffraction temperature | 100 K |
| Number of distinct elements | 5 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.0568 |
| Residual factor for significantly intense reflections | 0.038 |
| Weighted residual factors for significantly intense reflections | 0.0839 |
| Weighted residual factors for all reflections included in the refinement | 0.0923 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.041 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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