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Information card for entry 7038034
Preview
Coordinates | 7038034.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C88 H92 Cl2 O8 P2 Si2 U |
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Calculated formula | C88 H92 Cl2 O8 P2 Si2 U |
SMILES | O([U]([O]=P(c1ccccc1)(c1ccccc1)c1ccccc1)(Cl)(Cl)(O[Si](c1ccccc1)(c1ccccc1)c1ccccc1)[O]=P(c1ccccc1)(c1ccccc1)c1ccccc1)[Si](c1ccccc1)(c1ccccc1)c1ccccc1.O1CCCC1.O1CCCC1.O1CCCC1.O1CCCC1 |
Title of publication | Reductive silylation of Cp*UO2((Mes)PDI(Me)) promoted by Lewis bases. |
Authors of publication | Kiernicki, J. J.; Harwood, J. S.; Fanwick, P. E.; Bart, S. C. |
Journal of publication | Dalton transactions (Cambridge, England : 2003) |
Year of publication | 2016 |
Journal volume | 45 |
Journal issue | 7 |
Pages of publication | 3111 - 3119 |
a | 29.2654 ± 0.0007 Å |
b | 18.0309 ± 0.0004 Å |
c | 15.5926 ± 0.0004 Å |
α | 90° |
β | 91.09 ± 0.002° |
γ | 90° |
Cell volume | 8226.4 ± 0.3 Å3 |
Cell temperature | 200 ± 2 K |
Ambient diffraction temperature | 200 ± 2 K |
Number of distinct elements | 7 |
Space group number | 15 |
Hermann-Mauguin space group symbol | C 1 2/c 1 |
Hall space group symbol | -C 2yc |
Residual factor for all reflections | 0.0595 |
Residual factor for significantly intense reflections | 0.0568 |
Weighted residual factors for significantly intense reflections | 0.1657 |
Weighted residual factors for all reflections included in the refinement | 0.1694 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.164 |
Diffraction radiation wavelength | 1.54178 Å |
Diffraction radiation type | CuKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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