Information card for entry 7038035

Structure parameters

• Formula: C34 H49 F6 O11 P S2 Si2 U
• Calculated formula: C34 H49 F6 O11 P S2 Si2 U
• SMILES: [U](O[Si](C)(C)C)(O[Si](C)(C)C)([O]=P(c1ccccc1)(c1ccccc1)c1ccccc1)(OS(=O)(=O)C(F)(F)F)(OS(=O)(=O)C(F)(F)F)([O]1CCCC1)[O]1CCCC1
• Title of publication: Reductive silylation of Cp*UO2((Mes)PDI(Me)) promoted by Lewis bases.
• Authors of publication: Kiernicki, J. J.; Harwood, J. S.; Fanwick, P. E.; Bart, S. C.
• Journal of publication: Dalton transactions (Cambridge, England : 2003)
• Year of publication: 2016
• Journal volume: 45
• Journal issue: 7
• Pages of publication: 3111 - 3119
• a: 14.0951 ± 0.0003 Å
• b: 18.5493 ± 0.0004 Å
• c: 17.7595 ± 0.0005 Å
• α: 90°
• β: 92.379 ± 0.001°
• γ: 90°
• Cell volume: 4639.29 ± 0.19 ų
• Cell temperature: 200 ± 2 K
• Ambient diffraction temperature: 200 ± 2 K
• Number of distinct elements: 8
• Space group number: 14
• Hermann-Mauguin space group symbol: P 1 21/n 1
• Hall space group symbol: -P 2yn
• Residual factor for all reflections: 0.0474
• Residual factor for significantly intense reflections: 0.0459
• Weighted residual factors for significantly intense reflections: 0.1234
• Weighted residual factors for all reflections included in the refinement: 0.1247
• Goodness-of-fit parameter for all reflections included in the refinement: 1.056
• Diffraction radiation wavelength: 1.54178 Å
• Diffraction radiation type: CuKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No