Information card for entry 7044766

Structure parameters

• Formula: C66 H100 Li N6 O5 Si4 Y
• Calculated formula: C66 H100 Li N6 O5 Si4 Y
• SMILES: [Y]123(OC(C)(C)C)([N]([Si](C)(C)C)=C(N1c1c4c(N3[Si](C)(C)C)cccc4ccc1)c1ccccc1)[N]([Si](C)(C)C)=C(N2c1c2c(N[Si](C)(C)C)cccc2ccc1)c1ccccc1.[O]1(CCCC1)[Li]([O]1CCCC1)([O]1CCCC1)[O]1CCCC1
• Title of publication: Rare-earth metal-mediated PhC[triple bond, length as m-dash]N insertion into N,N-bis(trimethylsilyl)naphthalene-1,8-diamido dianion - a synthetic approach to complexes coordinated by ansa-bridged amido-amidinato ligand.
• Authors of publication: Lyubov, Dmitry M.; Cherkasov, Anton V.; Fukin, Georgy K.; Lyssenko, Konstantin A.; Rychagova, Elena A.; Ketkov, Sergey Yu; Trifonov, Alexander A.
• Journal of publication: Dalton transactions (Cambridge, England : 2003)
• Year of publication: 2018
• Journal volume: 47
• Journal issue: 2
• Pages of publication: 438 - 451
• a: 13.9163 ± 0.0011 Å
• b: 14.9401 ± 0.0013 Å
• c: 34.281 ± 0.003 Å
• α: 90°
• β: 97.727 ± 0.002°
• γ: 90°
• Cell volume: 7062.7 ± 1 ų
• Cell temperature: 150 ± 2 K
• Ambient diffraction temperature: 150 ± 2 K
• Number of distinct elements: 7
• Space group number: 14
• Hermann-Mauguin space group symbol: P 1 21/c 1
• Hall space group symbol: -P 2ybc
• Residual factor for all reflections: 0.1715
• Residual factor for significantly intense reflections: 0.071
• Weighted residual factors for significantly intense reflections: 0.1381
• Weighted residual factors for all reflections included in the refinement: 0.1746
• Goodness-of-fit parameter for all reflections included in the refinement: 0.953
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No