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Information card for entry 7110422
Preview
| Coordinates | 7110422.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C37 H100 Cl P4 Si W |
|---|---|
| Calculated formula | C39 H64 P4 Si W |
| SMILES | [W]12([P](C)(C)CC[P]1(C)C)([P](C)(C)CC[P]2(C)C)(#Cc1ccc(cc1)C#C[Si](C(C)C)(C(C)C)C(C)C)C#Cc1ccc(cc1)C |
| Title of publication | Synthesis and reactions of metallo-diethynylbenzenes: building blocks for redox-active poly(phenyleneethynylene)s† |
| Authors of publication | John, Kevin D.; Hopkins, Michael D. |
| Journal of publication | Chemical Communications |
| Year of publication | 1999 |
| Journal issue | 7 |
| Pages of publication | 589 |
| a | 8.977 ± 0.009 Å |
| b | 30.3 ± 0.03 Å |
| c | 16.449 ± 0.02 Å |
| α | 90° |
| β | 95.23 ± 0.09° |
| γ | 90° |
| Cell volume | 4456 ± 8 Å3 |
| Cell temperature | 213 ± 2 K |
| Ambient diffraction temperature | 213 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.2602 |
| Residual factor for significantly intense reflections | 0.1279 |
| Weighted residual factors for all reflections | 0.4043 |
| Weighted residual factors for significantly intense reflections | 0.2812 |
| Goodness-of-fit parameter for all reflections | 1.023 |
| Goodness-of-fit parameter for significantly intense reflections | 1.067 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/7110422.html
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Users of the data should acknowledge the original authors of the
structural data.