Information card for entry 7111009

Structure parameters

• Common name: [Li(thf)2{Si(SiMe3)3(C6H4(NCH2tBu)2)}]
• Formula: C33 H69 Li N2 O2 Si5
• Calculated formula: C33 H69 Li N2 O2 Si5
• SMILES: [Li]([Si]1([Si]([Si](C)(C)C)([Si](C)(C)C)[Si](C)(C)C)N(c2c(N1CC(C)(C)C)cccc2)CC(C)(C)C)([O]1CCCC1)[O]1CCCC1
• Title of publication: The diverse reactions of the silylene Si[(NCH2But)2C6H4-1,2] with Li[Si(SiMe3)3](thf)3 and K[N(SiMe3)2]
• Authors of publication: Gehrhus, Barbara; Hitchcock, Peter B.; Lappert, Michael F.; Slootweg, J. Chris
• Journal of publication: Chemical Communications
• Year of publication: 2000
• Journal issue: 15
• Pages of publication: 1427
• a: 12.8306 ± 0.0011 Å
• b: 18.4336 ± 0.0013 Å
• c: 18.7237 ± 0.0015 Å
• α: 90°
• β: 96.161 ± 0.004°
• γ: 90°
• Cell volume: 4402.8 ± 0.6 ų
• Cell temperature: 173 ± 2 K
• Ambient diffraction temperature: 173 ± 2 K
• Number of distinct elements: 6
• Space group number: 14
• Hermann-Mauguin space group symbol: P 1 21/n 1
• Hall space group symbol: -P 2yn
• Residual factor for all reflections: 0.0734
• Residual factor for significantly intense reflections: 0.0522
• Weighted residual factors for significantly intense reflections: 0.1257
• Weighted residual factors for all reflections included in the refinement: 0.1377
• Goodness-of-fit parameter for all reflections included in the refinement: 1.007
• Diffraction radiation probe: x-ray
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No