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Information card for entry 7112677
Preview
| Coordinates | 7112677.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C22 H21 Mo N S2 |
|---|---|
| Calculated formula | C22 H21 Mo N S2 |
| SMILES | [Mo]123456789(SC(=C(S1)c1ccccc1)C(C#N)(C)C)([cH]1[cH]2[cH]3[cH]4[cH]51)[cH]1[cH]9[cH]8[cH]7[cH]61 |
| Title of publication | A radical pathway to synthesise Mo and W dithiolene complexes. |
| Authors of publication | Tan, Ai Ling; Blake, Alexander J.; Davies, E. Stephen; Wilson, Claire; Garner, C. David |
| Journal of publication | Chemical communications (Cambridge, England) |
| Year of publication | 2011 |
| Journal volume | 47 |
| Journal issue | 3 |
| Pages of publication | 953 - 954 |
| a | 11.5767 ± 0.0011 Å |
| b | 11.6673 ± 0.0011 Å |
| c | 14.65 ± 0.0014 Å |
| α | 90° |
| β | 95.112 ± 0.002° |
| γ | 90° |
| Cell volume | 1970.9 ± 0.3 Å3 |
| Cell temperature | 150 ± 2 K |
| Ambient diffraction temperature | 150 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.0573 |
| Residual factor for significantly intense reflections | 0.0401 |
| Weighted residual factors for significantly intense reflections | 0.091 |
| Weighted residual factors for all reflections included in the refinement | 0.1032 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.045 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/7112677.html
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