Information card for entry 7120531
| Formula |
C78 H104 B2 K2 O6 |
| Calculated formula |
C78 H104 B2 K2 O6 |
| SMILES |
[B]1(c2ccccc2C2=C[C@@H]3[B](c4ccccc4C3=C[C@@H]12)(c1c(cc(cc1C)C)C)c1c(cc(cc1C)C)C)(c1c(cc(cc1C)C)C)c1c(cc(cc1C)C)C.[K]([O]1CCCC1)[O]1CCCC1.O1CCCC1.[K]([O]1CCCC1)[O]1CCCC1.O1CCCC1 |
| Title of publication |
Consecutive reduction, radical-cyclization, and oxidative-dehydrogenation reaction of ortho-substituted diboryl compound |
| Authors of publication |
Yu, Lirong; Li, Yanglizhi; Wang, Xi; Wang, Xingyong; Zhou, Panpan; Jiang, ShangDa; pan, xiaobo |
| Journal of publication |
Chem. Commun. |
| Year of publication |
2017 |
| a |
12.2166 ± 0.0009 Å |
| b |
12.8705 ± 0.0012 Å |
| c |
13.0567 ± 0.0012 Å |
| α |
72.277 ± 0.008° |
| β |
70.112 ± 0.007° |
| γ |
67.341 ± 0.008° |
| Cell volume |
1745.6 ± 0.3 Å3 |
| Cell temperature |
291.43 ± 0.1 K |
| Ambient diffraction temperature |
291.43 ± 0.1 K |
| Number of distinct elements |
5 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.1273 |
| Residual factor for significantly intense reflections |
0.0673 |
| Weighted residual factors for significantly intense reflections |
0.1448 |
| Weighted residual factors for all reflections included in the refinement |
0.183 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.025 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/7120531.html