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Information card for entry 7129728
Preview
| Coordinates | 7129728.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C72 H67 Si |
|---|---|
| Calculated formula | C72 H67 Si |
| SMILES | [Si](C#Cc1c2c(c([C](c3c4c(c(c5c3cccc5)c3c(cc(cc3C)C)C)cccc4)c3c4c(c(c5c3cccc5)c3c(cc(cc3C)C)C)cccc4)c3ccccc13)cccc2)(C(C)C)(C(C)C)C(C)C |
| Title of publication | Synthesis, properties and chemical modification of a persistent triisopropylsilylethynyl substituted tri(9-anthryl)methyl radical |
| Authors of publication | Nishiuchi, Tomohiko; Ishii, Daisuke; Aibara, Seito; Sato, Hiroyasu; Kubo, Takashi |
| Journal of publication | Chemical Communications |
| Year of publication | 2022 |
| a | 15.7578 ± 0.0007 Å |
| b | 16.3981 ± 0.0005 Å |
| c | 22.2474 ± 0.0008 Å |
| α | 90° |
| β | 109.503 ± 0.004° |
| γ | 90° |
| Cell volume | 5418.8 ± 0.4 Å3 |
| Cell temperature | 120.15 K |
| Ambient diffraction temperature | 120.15 K |
| Number of distinct elements | 3 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.1269 |
| Residual factor for significantly intense reflections | 0.0644 |
| Weighted residual factors for significantly intense reflections | 0.1565 |
| Weighted residual factors for all reflections included in the refinement | 0.1832 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.037 |
| Diffraction radiation probe | x-ray |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/7129728.html
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Users of the data should acknowledge the original authors of the
structural data.