Information card for entry 7203707

Structure parameters

• Formula: C24 H46 Hf N2 O6
• Calculated formula: C24 H46 Hf N2 O6
• SMILES: C1(C)(C)C2=[N](C(CO2)(C)C)[Hf]2([N]3C(C)(C)COC=3C(C)(C)O2)(O1)(OC(C)(C)C)OC(C)(C)C
• Title of publication: Deposition of HfO2 and ZrO2 films by liquid injection MOCVD using new monomeric alkoxide precursors
• Authors of publication: Loo, Yim Fun; O'Kane, Ruairi; Jones, Anthony C.; Aspinall, Helen C.; Potter, Richard J.; Chalker, Paul R.; Bickley, Jamie F.; Taylor, Stephen; Smith, Lesley M.
• Journal of publication: Journal of Materials Chemistry
• Year of publication: 2005
• Journal volume: 15
• Journal issue: 19
• Pages of publication: 1896
• a: 10.2341 ± 0.0004 Å
• b: 18.9036 ± 0.0008 Å
• c: 15.6521 ± 0.0006 Å
• α: 90°
• β: 105.011 ± 0.001°
• γ: 90°
• Cell volume: 2924.7 ± 0.2 ų
• Cell temperature: 100 ± 2 K
• Ambient diffraction temperature: 100 ± 2 K
• Number of distinct elements: 5
• Space group number: 14
• Hermann-Mauguin space group symbol: P 1 21/n 1
• Hall space group symbol: -P 2yn
• Residual factor for all reflections: 0.0341
• Residual factor for significantly intense reflections: 0.0277
• Weighted residual factors for significantly intense reflections: 0.0693
• Weighted residual factors for all reflections included in the refinement: 0.0719
• Goodness-of-fit parameter for all reflections included in the refinement: 1.062
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No