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Information card for entry 7204282
Preview
Coordinates | 7204282.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C15 H2 F6 N2 O10 Os3 |
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Calculated formula | C15 H2 F6 N2 O10 Os3 |
SMILES | [Os]123([Os]([Os]1(C#[O])(C#[O])(C#[O])C#[O])([H]2)([n]1n3c(C(F)(F)F)cc1C(F)(F)F)(C#[O])(C#[O])C#[O])(C#[O])(C#[O])C#[O] |
Title of publication | Deposition of osmium thin films using pyrazolate complexes as CVD source reagents |
Authors of publication | Chi, Yun; Yu, Huan-Li; Ching, Wei-Li; Liu, Chao-Shiuan; Chen, Yao-Lun; Chou, Tsung-Yi; Peng, Shie-Ming; Lee, Gene-Hsiang |
Journal of publication | Journal of Materials Chemistry |
Year of publication | 2002 |
Journal volume | 12 |
Journal issue | 5 |
Pages of publication | 1363 |
a | 16.7057 ± 0.0004 Å |
b | 7.7137 ± 0.0002 Å |
c | 18.8324 ± 0.0005 Å |
α | 90° |
β | 114.524 ± 0.001° |
γ | 90° |
Cell volume | 2207.87 ± 0.1 Å3 |
Cell temperature | 295 ± 2 K |
Ambient diffraction temperature | 295 ± 2 K |
Number of distinct elements | 6 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/c 1 |
Hall space group symbol | -P 2ybc |
Residual factor for all reflections | 0.0385 |
Residual factor for significantly intense reflections | 0.0297 |
Weighted residual factors for significantly intense reflections | 0.079 |
Weighted residual factors for all reflections included in the refinement | 0.0882 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.086 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/7204282.html
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