Information card for entry 7204282

Structure parameters

• Formula: C15 H2 F6 N2 O10 Os3
• Calculated formula: C15 H2 F6 N2 O10 Os3
• SMILES: [Os]123([Os]([Os]1(C#[O])(C#[O])(C#[O])C#[O])([H]2)([n]1n3c(C(F)(F)F)cc1C(F)(F)F)(C#[O])(C#[O])C#[O])(C#[O])(C#[O])C#[O]
• Title of publication: Deposition of osmium thin films using pyrazolate complexes as CVD source reagents
• Authors of publication: Chi, Yun; Yu, Huan-Li; Ching, Wei-Li; Liu, Chao-Shiuan; Chen, Yao-Lun; Chou, Tsung-Yi; Peng, Shie-Ming; Lee, Gene-Hsiang
• Journal of publication: Journal of Materials Chemistry
• Year of publication: 2002
• Journal volume: 12
• Journal issue: 5
• Pages of publication: 1363
• a: 16.7057 ± 0.0004 Å
• b: 7.7137 ± 0.0002 Å
• c: 18.8324 ± 0.0005 Å
• α: 90°
• β: 114.524 ± 0.001°
• γ: 90°
• Cell volume: 2207.87 ± 0.1 ų
• Cell temperature: 295 ± 2 K
• Ambient diffraction temperature: 295 ± 2 K
• Number of distinct elements: 6
• Space group number: 14
• Hermann-Mauguin space group symbol: P 1 21/c 1
• Hall space group symbol: -P 2ybc
• Residual factor for all reflections: 0.0385
• Residual factor for significantly intense reflections: 0.0297
• Weighted residual factors for significantly intense reflections: 0.079
• Weighted residual factors for all reflections included in the refinement: 0.0882
• Goodness-of-fit parameter for all reflections included in the refinement: 1.086
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No