Information card for entry 7204283

Structure parameters

• Formula: C16 H2 F12 N4 O6 Os2
• Calculated formula: C16 H2 F12 N4 O6 Os2
• SMILES: C([Os]12(C#[O])(n3c(cc(C(F)(F)F)[n]3[Os]2(C#[O])(C#[O])(C#[O])n2c(cc(C(F)(F)F)[n]12)C(F)(F)F)C(F)(F)F)C#[O])#[O]
• Title of publication: Deposition of osmium thin films using pyrazolate complexes as CVD source reagents
• Authors of publication: Chi, Yun; Yu, Huan-Li; Ching, Wei-Li; Liu, Chao-Shiuan; Chen, Yao-Lun; Chou, Tsung-Yi; Peng, Shie-Ming; Lee, Gene-Hsiang
• Journal of publication: Journal of Materials Chemistry
• Year of publication: 2002
• Journal volume: 12
• Journal issue: 5
• Pages of publication: 1363
• a: 11.9181 ± 0.0002 Å
• b: 11.9181 ± 0.0002 Å
• c: 8.2009 ± 0.0002 Å
• α: 90°
• β: 90°
• γ: 90°
• Cell volume: 1164.86 ± 0.04 ų
• Cell temperature: 295 ± 2 K
• Ambient diffraction temperature: 295 ± 2 K
• Number of distinct elements: 6
• Space group number: 113
• Hermann-Mauguin space group symbol: P -4 21 m
• Hall space group symbol: P -4 2ab
• Residual factor for all reflections: 0.0157
• Residual factor for significantly intense reflections: 0.0146
• Weighted residual factors for significantly intense reflections: 0.0363
• Weighted residual factors for all reflections included in the refinement: 0.0365
• Goodness-of-fit parameter for all reflections included in the refinement: 1.094
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No