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Information card for entry 7204598
Preview
| Coordinates | 7204598.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C12 H8 F6 O6 Ru |
|---|---|
| Calculated formula | C12 H8 F6 O6 Ru |
| Title of publication | Deposition of Ru and RuO2 thin films employing dicarbonyl bis-diketonate ruthenium complexes as CVD source reagents |
| Authors of publication | Lai, Ying-Hui; Chen, Yao-Lun; Chi, Yun; Liu, Chao-Shiuan; Carty, Arthur J.; Peng, Shie-Ming; Lee, Gene-Hsiang |
| Journal of publication | Journal of Materials Chemistry |
| Year of publication | 2003 |
| Journal volume | 13 |
| Journal issue | 8 |
| Pages of publication | 1999 |
| a | 7.7805 ± 0.0008 Å |
| b | 9.2982 ± 0.0011 Å |
| c | 12.251 ± 0.002 Å |
| α | 74.53 ± 0.013° |
| β | 83.433 ± 0.013° |
| γ | 75.538 ± 0.011° |
| Cell volume | 826 ± 0.2 Å3 |
| Cell temperature | 295 ± 2 K |
| Ambient diffraction temperature | 295 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.03 |
| Residual factor for significantly intense reflections | 0.0267 |
| Weighted residual factors for all reflections | 0.0756 |
| Weighted residual factors for significantly intense reflections | 0.0741 |
| Goodness-of-fit parameter for all reflections | 1.089 |
| Goodness-of-fit parameter for significantly intense reflections | 1.118 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | Yes |
| Has Fobs | No |
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