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Information card for entry 7218848
Preview
Coordinates | 7218848.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C56 H58 N4 O10 S2 |
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Calculated formula | C56 H58 N4 O10 S2 |
SMILES | C(c1ccccc1)(c1ccccc1)([NH3+])c1ccccc1.[O-]S(=O)(=O)c1cc(ccc1O)c1ccc(O)c(S(=O)(=O)[O-])c1.O=CN(C)C.C(c1ccccc1)(c1ccccc1)([NH3+])c1ccccc1.N(C=O)(C)C |
Title of publication | Influence of solvents and assembly on the supramolecular patterns and luminescent properties of organic salts comprising 4,4’-dihydroxybiphenyl-3,3’-disulfonate and triphenylmethanaminium |
Authors of publication | Li, Ya-Nan; Huo, Li-Hua; Yu, Yi-Zhe; Ge, Fa-Yuan; Deng, Zhao-Peng; Zhu, Zhi-Biao; Gao, Shan |
Journal of publication | RSC Adv. |
Year of publication | 2014 |
a | 10.6098 ± 0.001 Å |
b | 12.0437 ± 0.0009 Å |
c | 12.3814 ± 0.0008 Å |
α | 64.981 ± 0.007° |
β | 78.038 ± 0.007° |
γ | 66.971 ± 0.008° |
Cell volume | 1317.7 ± 0.2 Å3 |
Cell temperature | 295 ± 2 K |
Ambient diffraction temperature | 295 ± 2 K |
Number of distinct elements | 5 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0741 |
Residual factor for significantly intense reflections | 0.0522 |
Weighted residual factors for significantly intense reflections | 0.1228 |
Weighted residual factors for all reflections included in the refinement | 0.1372 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.024 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/7218848.html
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