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Information card for entry 7218849
Preview
Coordinates | 7218849.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C54 H56 N2 O10 S4 |
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Calculated formula | C54 H56 N2 O10 S4 |
SMILES | C(c1ccccc1)(c1ccccc1)([NH3+])c1ccccc1.[O-]S(=O)(=O)c1c(O)ccc(c1)c1ccc(O)c(S(=O)(=O)[O-])c1.O=S(C)C.C(c1ccccc1)(c1ccccc1)([NH3+])c1ccccc1.O=S(C)C |
Title of publication | Influence of solvents and assembly on the supramolecular patterns and luminescent properties of organic salts comprising 4,4’-dihydroxybiphenyl-3,3’-disulfonate and triphenylmethanaminium |
Authors of publication | Li, Ya-Nan; Huo, Li-Hua; Yu, Yi-Zhe; Ge, Fa-Yuan; Deng, Zhao-Peng; Zhu, Zhi-Biao; Gao, Shan |
Journal of publication | RSC Adv. |
Year of publication | 2014 |
a | 8.9446 ± 0.0008 Å |
b | 11.97 ± 0.001 Å |
c | 12.7475 ± 0.0008 Å |
α | 103.421 ± 0.006° |
β | 107.836 ± 0.007° |
γ | 94.705 ± 0.007° |
Cell volume | 1246.36 ± 0.19 Å3 |
Cell temperature | 295 ± 2 K |
Ambient diffraction temperature | 295 ± 2 K |
Number of distinct elements | 5 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0728 |
Residual factor for significantly intense reflections | 0.0538 |
Weighted residual factors for significantly intense reflections | 0.1404 |
Weighted residual factors for all reflections included in the refinement | 0.156 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.035 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/7218849.html
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