Information card for entry 7228748
| Common name |
epalerstat. 2 DMSO |
| Chemical name |
2-[(5Z)-5-[(E)-2-methyl-3-phenylprop-2-enylidene]-4-oxo-2-sulfanylidene-1,3-thiazolidin-3-yl]a |
| Formula |
C19 H25 N O5 S4 |
| Calculated formula |
C19 H25 N O5 S4 |
| SMILES |
C(=O)(CN1C(=S)SC(=C\C(=C\c2ccccc2)C)/C1=O)O.O=S(C)C.O=S(C)C |
| Title of publication |
Solubility improvement of epalrestat by layered structure formation via cocrystallization |
| Authors of publication |
Putra, Okky Dwichandra; Umeda, Daiki; Nugraha, Yuda Prasetya; Furuishi, Takayuki; Fukuzawa, Kaori; Nagase, Hiromasa; Uekusa, Hidehiro; Yonemochi, Etsuo |
| Journal of publication |
CrystEngComm |
| Year of publication |
2017 |
| a |
8.0773 ± 0.0002 Å |
| b |
9.3224 ± 0.0002 Å |
| c |
16.0729 ± 0.0003 Å |
| α |
99.322 ± 0.007° |
| β |
91.404 ± 0.006° |
| γ |
108.099 ± 0.008° |
| Cell volume |
1131.59 ± 0.07 Å3 |
| Cell temperature |
93 ± 2 K |
| Ambient diffraction temperature |
93 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.0656 |
| Residual factor for significantly intense reflections |
0.0516 |
| Weighted residual factors for significantly intense reflections |
0.1289 |
| Weighted residual factors for all reflections included in the refinement |
0.1359 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.16 |
| Diffraction radiation wavelength |
1.54187 Å |
| Diffraction radiation type |
CuKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/7228748.html