Oxidation of rubrene, and implications for device stability
Authors of publication
Ly, Jack T.; Lopez, Steven A.; Lin, Janice B.; Kim, Jae Joon; Lee, Hyunbok; Burnett, Edmund K.; Zhang, Lei; Aspuru-Guzik, Alán; Houk, K. N.; Briseno, Alejandro L.
Journal of publication
Journal of Materials Chemistry C
Year of publication
2018
Journal volume
6
Journal issue
14
Pages of publication
3757
a
11.1664 ± 0.0011 Å
b
21.792 ± 0.002 Å
c
13.6426 ± 0.0011 Å
α
90°
β
102.995 ± 0.007°
γ
90°
Cell volume
3234.7 ± 0.5 Å3
Cell temperature
180 ± 2 K
Ambient diffraction temperature
180 ± 2 K
Number of distinct elements
4
Space group number
14
Hermann-Mauguin space group symbol
P 1 21/c 1
Hall space group symbol
-P 2ybc
Residual factor for all reflections
0.1098
Residual factor for significantly intense reflections
0.068
Weighted residual factors for significantly intense reflections
0.1667
Weighted residual factors for all reflections included in the refinement
0.2027
Goodness-of-fit parameter for all reflections included in the refinement