Oxidation of rubrene, and implications for device stability
Authors of publication
Ly, Jack T.; Lopez, Steven A.; Lin, Janice B.; Kim, Jae Joon; Lee, Hyunbok; Burnett, Edmund K.; Zhang, Lei; Aspuru-Guzik, Alán; Houk, K. N.; Briseno, Alejandro L.
Journal of publication
Journal of Materials Chemistry C
Year of publication
2018
Journal volume
6
Journal issue
14
Pages of publication
3757
a
9.6112 ± 0.0001 Å
b
11.7137 ± 0.0002 Å
c
13.927 ± 0.0002 Å
α
107.974 ± 0.0008°
β
106.671 ± 0.0007°
γ
100.746 ± 0.0008°
Cell volume
1362.13 ± 0.04 Å3
Cell temperature
90 ± 0.2 K
Ambient diffraction temperature
90 ± 0.2 K
Number of distinct elements
3
Space group number
2
Hermann-Mauguin space group symbol
P -1
Hall space group symbol
-P 1
Residual factor for all reflections
0.071
Residual factor for significantly intense reflections
0.0489
Weighted residual factors for significantly intense reflections
0.1221
Weighted residual factors for all reflections included in the refinement
0.1385
Goodness-of-fit parameter for all reflections included in the refinement