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Information card for entry 7237063
Preview
Coordinates | 7237063.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C39 H29 O |
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Calculated formula | C39 H29 O |
Title of publication | Oxidation of rubrene, and implications for device stability |
Authors of publication | Ly, Jack T.; Lopez, Steven A.; Lin, Janice B.; Kim, Jae Joon; Lee, Hyunbok; Burnett, Edmund K.; Zhang, Lei; Aspuru-Guzik, Alán; Houk, K. N.; Briseno, Alejandro L. |
Journal of publication | Journal of Materials Chemistry C |
Year of publication | 2018 |
Journal volume | 6 |
Journal issue | 14 |
Pages of publication | 3757 |
a | 9.6112 ± 0.0001 Å |
b | 11.7137 ± 0.0002 Å |
c | 13.927 ± 0.0002 Å |
α | 107.974 ± 0.0008° |
β | 106.671 ± 0.0007° |
γ | 100.746 ± 0.0008° |
Cell volume | 1362.13 ± 0.04 Å3 |
Cell temperature | 90 ± 0.2 K |
Ambient diffraction temperature | 90 ± 0.2 K |
Number of distinct elements | 3 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.071 |
Residual factor for significantly intense reflections | 0.0489 |
Weighted residual factors for significantly intense reflections | 0.1221 |
Weighted residual factors for all reflections included in the refinement | 0.1385 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.055 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | Yes |
Has Fobs | No |
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The link is: https://www.crystallography.net/7237063.html
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