Information card for entry 7710594
Formula |
C32 H52 B Br N3 Si |
Calculated formula |
C32 H52 B Br N3 Si |
Title of publication |
High yield of a variety of silicon-boron radicals and their reactivity |
Authors of publication |
Roesky, Herbert W.; Nazish, Mohd; Ding, Yi; Legendre, Christina M.; Kumar, Arun; Graw, Nico; Schwederski, Brigitte; Herbst-Irmer, Regine; P, Parvathy; Parameswaran, Pattiyil; Stalke, Dietmar; Kaim, Wolfgang |
Journal of publication |
Dalton Transactions |
Year of publication |
2022 |
a |
11.102 ± 0.002 Å |
b |
14.901 ± 0.002 Å |
c |
21.157 ± 0.003 Å |
α |
90° |
β |
102.55 ± 0.02° |
γ |
90° |
Cell volume |
3416.4 ± 0.9 Å3 |
Cell temperature |
100 ± 2 K |
Ambient diffraction temperature |
100 ± 2 K |
Number of distinct elements |
6 |
Space group number |
14 |
Hermann-Mauguin space group symbol |
P 1 21/n 1 |
Hall space group symbol |
-P 2yn |
Residual factor for all reflections |
0.0418 |
Residual factor for significantly intense reflections |
0.0325 |
Weighted residual factors for significantly intense reflections |
0.0788 |
Weighted residual factors for all reflections included in the refinement |
0.083 |
Goodness-of-fit parameter for all reflections included in the refinement |
1.045 |
Diffraction radiation wavelength |
0.71073 Å |
Diffraction radiation type |
MoKα |
Has coordinates |
Yes |
Has disorder |
Yes |
Has Fobs |
No |
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https://www.crystallography.net/7710594.html