Crystallography Open Database

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Searching journal of publication like 'ACS nano' volume of publication is 2

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4503881 CIFC42 H24 Br I22 S24P 4/m b m23.435; 23.435; 8.13
90; 90; 90		4465Yamamoto, Hiroshi M.; Kosaka, Yosuke; Maeda, Ryoko; Yamaura, Jun-ichi; Nakao, Akiko; Nakamura, Toshikazu; Kato, Reizo
Supramolecular insulating networks sheathing conducting nanowires based on organic radical cations.
ACS nano, 2008, 2, 143-155
4503882 CIFC42 H24 I23 S16 Se8P 4/m b m23.825; 23.825; 8.088
90; 90; 90		4591Yamamoto, Hiroshi M.; Kosaka, Yosuke; Maeda, Ryoko; Yamaura, Jun-ichi; Nakao, Akiko; Nakamura, Toshikazu; Kato, Reizo
Supramolecular insulating networks sheathing conducting nanowires based on organic radical cations.
ACS nano, 2008, 2, 143-155
4503883 CIFC38 H16 Br I22 S24P 4/m b m23.389; 23.389; 7.995
90; 90; 90		4373.6Yamamoto, Hiroshi M.; Kosaka, Yosuke; Maeda, Ryoko; Yamaura, Jun-ichi; Nakao, Akiko; Nakamura, Toshikazu; Kato, Reizo
Supramolecular insulating networks sheathing conducting nanowires based on organic radical cations.
ACS nano, 2008, 2, 143-155
4503884 CIFC15 H12 Cl I6 Se4P b a m14.322; 22.811; 7.923
90; 90; 90		2588.4Yamamoto, Hiroshi M.; Kosaka, Yosuke; Maeda, Ryoko; Yamaura, Jun-ichi; Nakao, Akiko; Nakamura, Toshikazu; Kato, Reizo
Supramolecular insulating networks sheathing conducting nanowires based on organic radical cations.
ACS nano, 2008, 2, 143-155
4503885 CIFC44 H28 Cl F4 I4 S16P -110.596; 17.69; 7.784
98.066; 94.176; 100.044		1415.4Yamamoto, Hiroshi M.; Kosaka, Yosuke; Maeda, Ryoko; Yamaura, Jun-ichi; Nakao, Akiko; Nakamura, Toshikazu; Kato, Reizo
Supramolecular insulating networks sheathing conducting nanowires based on organic radical cations.
ACS nano, 2008, 2, 143-155
4503886 CIFC26 H4 Cl F6 I4 Se4P 1 2/c 120.159; 4.073; 20.481
90; 108.75; 90		1592.4Yamamoto, Hiroshi M.; Kosaka, Yosuke; Maeda, Ryoko; Yamaura, Jun-ichi; Nakao, Akiko; Nakamura, Toshikazu; Kato, Reizo
Supramolecular insulating networks sheathing conducting nanowires based on organic radical cations.
ACS nano, 2008, 2, 143-155
4503887 CIFC52 H40 I8 O14 Si8I 4/m20.0403; 20.0403; 21.4606
90; 90; 90		8618.9Roll, Mark F.; Asuncion, Michael Z.; Kampf, Jeffrey; Laine, Richard M.
para-Octaiodophenylsilsesquioxane, [p-IC6H4SiO(1.5)]8, a nearly perfect nano-building block.
ACS nano, 2008, 2, 320-326

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