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Information card for entry 4074896
Preview
| Coordinates | 4074896.cif |
|---|---|
| Original paper (by DOI) | HTML |
| External links | PubChem |
| Common name | 6 |
|---|---|
| Chemical name | Bis[N-(isopropylideneimino)acetimidato-N,O]diphenylsilicon(IV) |
| Formula | C22 H28 N4 O2 Si |
| Calculated formula | C22 H28 N4 O2 Si |
| SMILES | [Si]12(OC(=N[N]1=C(C)C)C)(OC(=N[N]2=C(C)C)C)(c1ccccc1)c1ccccc1 |
| Title of publication | Octahedral and Bicapped-Tetrahedral Silicon Configurations in the Solid State and Their Dynamic Coexistence in Solution |
| Authors of publication | Kalikhman, Inna; Gostevskii, Boris; Botoshansky, Mark; Kaftory, Menahem; Tessier, Claire A.; Panzner, Matthew J.; Youngs, Wiley J.; Kost, Daniel |
| Journal of publication | Organometallics |
| Year of publication | 2006 |
| Journal volume | 25 |
| Journal issue | 5 |
| Pages of publication | 1252 - 1258 |
| a | 9.225 ± 0.002 Å |
| b | 10.709 ± 0.002 Å |
| c | 22.519 ± 0.004 Å |
| α | 90° |
| β | 99.66 ± 0.03° |
| γ | 90° |
| Cell volume | 2193.1 ± 0.8 Å3 |
| Cell temperature | 230 ± 1 K |
| Ambient diffraction temperature | 293 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/c 1 |
| Hall space group symbol | -P 2ybc |
| Residual factor for all reflections | 0.1366 |
| Residual factor for significantly intense reflections | 0.0617 |
| Weighted residual factors for significantly intense reflections | 0.15 |
| Weighted residual factors for all reflections included in the refinement | 0.1775 |
| Goodness-of-fit parameter for all reflections included in the refinement | 0.963 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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Users of the data should acknowledge the original authors of the
structural data.