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Information card for entry 1502789
Preview
| Coordinates | 1502789.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C79 H104 Cl4 O2 Si2 Ti2 |
|---|---|
| Calculated formula | C79 H104 Cl4 O2 Si2 Ti2 |
| Title of publication | Rational Design of Silicon-Bridged Fluorenyl−Phenoxy Group 4 Metal Complexes as Catalysts for Producing High Molecular Weight Copolymers of Ethylene and 1-Hexene at Elevated Temperature |
| Authors of publication | Senda, Taichi; Hanaoka, Hidenori; Nakahara, Shinya; Oda, Yoshiaki; Tsurugi, Hayato; Mashima, Kazushi |
| Journal of publication | Macromolecules |
| Year of publication | 2010 |
| Journal volume | 43 |
| Journal issue | 5 |
| Pages of publication | 2299 |
| a | 26.407 ± 0.013 Å |
| b | 14.346 ± 0.007 Å |
| c | 20.052 ± 0.01 Å |
| α | 90° |
| β | 96.115 ± 0.007° |
| γ | 90° |
| Cell volume | 7553 ± 6 Å3 |
| Cell temperature | 113 ± 2 K |
| Ambient diffraction temperature | 113 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 15 |
| Hermann-Mauguin space group symbol | C 1 2/c 1 |
| Hall space group symbol | -C 2yc |
| Residual factor for all reflections | 0.1258 |
| Residual factor for significantly intense reflections | 0.0808 |
| Weighted residual factors for significantly intense reflections | 0.1999 |
| Weighted residual factors for all reflections included in the refinement | 0.2475 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.059 |
| Diffraction radiation wavelength | 0.71075 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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