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Information card for entry 4074895
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Coordinates | 4074895.cif |
---|---|
Original paper (by DOI) | HTML |
Common name | 5 |
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Chemical name | Bis[N'-(dimethylamino)N",N"-(dimethyl)carbamoimidato-N,O]diphenylsilicon(IV) |
Formula | C22 H34 N6 O2 Si |
Calculated formula | C22 H34 N6 O2 Si |
SMILES | [Si]12(OC(=N[N]1(C)C)N(C)C)(OC(=N[N]2(C)C)N(C)C)(c1ccccc1)c1ccccc1 |
Title of publication | Octahedral and Bicapped-Tetrahedral Silicon Configurations in the Solid State and Their Dynamic Coexistence in Solution |
Authors of publication | Kalikhman, Inna; Gostevskii, Boris; Botoshansky, Mark; Kaftory, Menahem; Tessier, Claire A.; Panzner, Matthew J.; Youngs, Wiley J.; Kost, Daniel |
Journal of publication | Organometallics |
Year of publication | 2006 |
Journal volume | 25 |
Journal issue | 5 |
Pages of publication | 1252 - 1258 |
a | 34.89 ± 0.003 Å |
b | 9.3494 ± 0.0008 Å |
c | 15.8794 ± 0.0013 Å |
α | 90° |
β | 114.996 ± 0.001° |
γ | 90° |
Cell volume | 4694.7 ± 0.7 Å3 |
Cell temperature | 100 ± 2 K |
Ambient diffraction temperature | 100 ± 2 K |
Number of distinct elements | 5 |
Space group number | 15 |
Hermann-Mauguin space group symbol | C 1 2/c 1 |
Hall space group symbol | -C 2yc |
Residual factor for all reflections | 0.0585 |
Residual factor for significantly intense reflections | 0.0468 |
Weighted residual factors for significantly intense reflections | 0.1073 |
Weighted residual factors for all reflections included in the refinement | 0.1127 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.061 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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