Information card for entry 4133605

Structure parameters

• Formula: C45 H58 Al2 Br6 Ge N4 O Si2
• Calculated formula: C45 H58 Al2 Br6 Ge N4 O Si2
• SMILES: [Ge]1([Si]2([N](C(C)(C)C)=C(N2C(C)(C)C)c2ccccc2)c2cccc3c2Oc2c([Si]41[N](=C(N4C(C)(C)C)c1ccccc1)C(C)(C)C)cccc2C3(C)C)([Al](Br)(Br)Br)[Al](Br)(Br)Br
• Title of publication: An Isolable Bis(silylene)-Stabilized Germylone and Its Reactivity.
• Authors of publication: Wang, Yuwen; Karni, Miriam; Yao, Shenglai; Apeloig, Yitzhak; Driess, Matthias
• Journal of publication: Journal of the American Chemical Society
• Year of publication: 2019
• Journal volume: 141
• Journal issue: 4
• Pages of publication: 1655 - 1664
• a: 11.4436 ± 0.0003 Å
• b: 22.3224 ± 0.0006 Å
• c: 13.7102 ± 0.0004 Å
• α: 90°
• β: 102.777 ± 0.003°
• γ: 90°
• Cell volume: 3415.53 ± 0.17 ų
• Cell temperature: 150 ± 2 K
• Ambient diffraction temperature: 150 ± 2 K
• Number of distinct elements: 8
• Space group number: 4
• Hermann-Mauguin space group symbol: P 1 21 1
• Hall space group symbol: P 2yb
• Residual factor for all reflections: 0.12
• Residual factor for significantly intense reflections: 0.0993
• Weighted residual factors for significantly intense reflections: 0.2472
• Weighted residual factors for all reflections included in the refinement: 0.2788
• Goodness-of-fit parameter for all reflections included in the refinement: 1.063
• Diffraction radiation wavelength: 1.54184 Å
• Diffraction radiation type: CuKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No