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Information card for entry 4133626
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Jmol._Canvas2D (Jmol) "jmolApplet0"[x]
Coordinates | 4133626.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C42 H54 Fe N4 O2 Si2 |
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Calculated formula | C42 H54 Fe N4 O2 Si2 |
SMILES | C1(c2ccccc2)=[N](C(C)(C)C)[Si]23(C(=C=O)[Si]4(O3)([c]35[cH]6[Fe]789%10%11%123([cH]3[cH]7[cH]8[cH]9[c]2%103)[cH]5[cH]%11[cH]6%12)[N](=C(c2ccccc2)N4C(C)(C)C)C(C)(C)C)N1C(C)(C)C |
Title of publication | Silicon-Mediated Selective Homo- and Heterocoupling of Carbon Monoxide. |
Authors of publication | Wang, Yuwen; Kostenko, Arseni; Hadlington, Terrance J.; Luecke, Marcel-Philip; Yao, Shenglai; Driess, Matthias |
Journal of publication | Journal of the American Chemical Society |
Year of publication | 2019 |
Journal volume | 141 |
Journal issue | 1 |
Pages of publication | 626 - 634 |
a | 16.8653 ± 0.0009 Å |
b | 24.8239 ± 0.0009 Å |
c | 9.3582 ± 0.0004 Å |
α | 90° |
β | 90° |
γ | 90° |
Cell volume | 3917.9 ± 0.3 Å3 |
Cell temperature | 150 ± 2 K |
Ambient diffraction temperature | 150 ± 2 K |
Number of distinct elements | 6 |
Space group number | 62 |
Hermann-Mauguin space group symbol | P n m a |
Hall space group symbol | -P 2ac 2n |
Residual factor for all reflections | 0.0766 |
Residual factor for significantly intense reflections | 0.0455 |
Weighted residual factors for significantly intense reflections | 0.0955 |
Weighted residual factors for all reflections included in the refinement | 0.1126 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.018 |
Diffraction radiation wavelength | 1.54184 Å |
Diffraction radiation type | CuKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4133626.html
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Users of the data should acknowledge the original authors of the
structural data.