Information card for entry 4322355

Structure parameters

• Formula: C44 H94 B2 Li2 N4 O4 P2 Si5
• Calculated formula: C44 H94 B2 Li2 N4 O4 P2 Si5
• SMILES: [P]12([Si]([P](B(N([Si](C)(C)C)[Si](C)(C)C)N(C(C)C)C(C)C)([Li]31[O](C)CC[O]3C)[Li]12[O](C)CC[O]1C)(c1ccccc1)c1ccccc1)B(N([Si](C)(C)C)[Si](C)(C)C)N(C(C)C)C(C)C
• Title of publication: Synthesis and Chemistry of Bis(borylphosphino)silanes and -germanes
• Authors of publication: Tuqiang Chen; Eileen N. Duesler; Robert T. Paine; Heinrich Nöth
• Journal of publication: Inorganic Chemistry
• Year of publication: 1999
• Journal volume: 38
• Pages of publication: 4993 - 4999
• a: 11.939 ± 0.002 Å
• b: 24.516 ± 0.003 Å
• c: 21.572 ± 0.003 Å
• α: 90°
• β: 101.52 ± 0.01°
• γ: 90°
• Cell volume: 6186.9 ± 1.6 ų
• Cell temperature: 293 ± 2 K
• Ambient diffraction temperature: 293 ± 2 K
• Number of distinct elements: 8
• Space group number: 14
• Hermann-Mauguin space group symbol: P 1 21/n 1
• Hall space group symbol: -P 2yn
• Residual factor for all reflections: 0.1273
• Residual factor for significantly intense reflections: 0.0377
• Weighted residual factors for significantly intense reflections: 0.0856
• Weighted residual factors for all reflections included in the refinement: 0.132
• Goodness-of-fit parameter for all reflections included in the refinement: 1.001
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No