Information card for entry 7002921

Structure parameters

• Formula: C22 H30 Br2 Cl8 Ga4 Si2
• Calculated formula: C22 H30 Br2 Cl8 Ga4 Si2
• SMILES: c1c2C[C@]([Ga]3(Cl)[Cl][Ga]([C@@]4(Cc5c(cccc5)[Br][Ga]4(Cl)Cl)[Si](C)(C)C)(Cl)[Cl]3)([Ga]([Br]c2ccc1)(Cl)Cl)[Si](C)(C)C
• Title of publication: The influence of halogen substituents on the course of hydrogallation and hydroalumination reactions
• Authors of publication: Uhl, Werner; Claesener, Michael; Hepp, Alexander; Jasper, Beate; Vinogradov, Andrej; van Wüllen, Leo; Köster, Thomas K.-J.
• Journal of publication: Dalton Transactions
• Year of publication: 2009
• Journal issue: 47
• Pages of publication: 10550 - 10562
• a: 8.9602 ± 0.0006 Å
• b: 11.631 ± 0.0008 Å
• c: 17.8919 ± 0.0012 Å
• α: 90°
• β: 101.593 ± 0.001°
• γ: 90°
• Cell volume: 1826.6 ± 0.2 ų
• Cell temperature: 153 ± 2 K
• Ambient diffraction temperature: 153 ± 2 K
• Number of distinct elements: 6
• Space group number: 14
• Hermann-Mauguin space group symbol: P 1 21/n 1
• Hall space group symbol: -P 2yn
• Residual factor for all reflections: 0.0436
• Residual factor for significantly intense reflections: 0.0336
• Weighted residual factors for significantly intense reflections: 0.0824
• Weighted residual factors for all reflections included in the refinement: 0.0869
• Goodness-of-fit parameter for all reflections included in the refinement: 1.014
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No