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Information card for entry 7033136
Preview
| Coordinates | 7033136.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C33 H26 F6 N5 O2 P Ru |
|---|---|
| Calculated formula | C33 H26 F6 N5 O2 P Ru |
| SMILES | [Ru]123([n]4c(c5c1cccc5)cc(cc4)C(=O)OC)([n]1ccccc1c1[n]2cccc1)[n]1ccccc1c1[n]3cccc1.[P](F)(F)(F)(F)(F)[F-] |
| Title of publication | Sticking and patching: tuning and anchoring cyclometallated ruthenium(II) complexes. |
| Authors of publication | Ertl, Cathrin D.; Ris, Daniel P.; Meier, Stefan C.; Constable, Edwin C.; Housecroft, Catherine E.; Neuburger, Markus; Zampese, Jennifer A. |
| Journal of publication | Dalton transactions (Cambridge, England : 2003) |
| Year of publication | 2015 |
| Journal volume | 44 |
| Journal issue | 4 |
| Pages of publication | 1557 - 1570 |
| a | 12.9211 ± 0.0007 Å |
| b | 16.9306 ± 0.001 Å |
| c | 15.0031 ± 0.0009 Å |
| α | 90° |
| β | 108.261 ± 0.002° |
| γ | 90° |
| Cell volume | 3116.8 ± 0.3 Å3 |
| Cell temperature | 123 ± 2 K |
| Ambient diffraction temperature | 123 ± 2 K |
| Number of distinct elements | 7 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.0276 |
| Residual factor for significantly intense reflections | 0.0248 |
| Weighted residual factors for significantly intense reflections | 0.0642 |
| Weighted residual factors for all reflections included in the refinement | 0.0664 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.047 |
| Diffraction radiation wavelength | 1.54178 Å |
| Diffraction radiation type | CuKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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