Crystallography Open Database

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Searching journal of publication like 'Journal of Materials Chemistry' volume of publication is 18

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7202179 CIFBa O2.68 Y0.1 Zr0.9P m -3 m4.19943; 4.19943; 4.19943
90; 90; 90
74.0578Azad, Abul K.; Savaniu, Cristian; Tao, Shanwen; Duval, Sophie; Holtappels, Peter; Ibberson, Richard M.; Irvine, John T. S.
Structural origins of the differing grain conductivity values in BaZr0.9Y0.1O2.95 and indication of novel approach to counter defect association
Journal of Materials Chemistry, 2008, 18, 3414
7202196 CIFC34 H38 N2 O5 P SP -112.042; 12.306; 11.691
95.75; 111.52; 83.2
1597.3Akutsu, Hiroki; Sato, Keiko; Yamashita, Shinji; Yamada, Jun-ichi; Nakatsuji, Shin'ichi; Turner, Scott S.
The first organic paramagnetic metal containing the aminoxyl radical
Journal of Materials Chemistry, 2008, 18, 3313
7202197 CIFC30 H34 N2 O5 S17P -112.436; 19.528; 9.326
97.06; 110.22; 83.44
2102.9Akutsu, Hiroki; Sato, Keiko; Yamashita, Shinji; Yamada, Jun-ichi; Nakatsuji, Shin'ichi; Turner, Scott S.
The first organic paramagnetic metal containing the aminoxyl radical
Journal of Materials Chemistry, 2008, 18, 3313
7202225 CIFC15 H20 O ZrP 1 21/n 17.6566; 14.2184; 12.4639
90; 91.546; 90
1356.4Black, Kate; Aspinall, Helen C.; Jones, Anthony C.; Przybylak, Katarzyna; Bacsa, John; Chalker, Paul R.; Taylor, Stephen; Zhao, Ce Zhou; Elliott, Simon D.; Zydor, Aleksandra; Heys, Peter N.
Deposition of ZrO2 and HfO2 thin films by liquid injection MOCVD and ALD using ansa-metallocene zirconium and hafnium precursors
Journal of Materials Chemistry, 2008, 18, 4561
7202226 CIFC15 H20 HfP 1 21/m 17.17; 9.053; 10.385
90; 91.14; 90
674Black, Kate; Aspinall, Helen C.; Jones, Anthony C.; Przybylak, Katarzyna; Bacsa, John; Chalker, Paul R.; Taylor, Stephen; Zhao, Ce Zhou; Elliott, Simon D.; Zydor, Aleksandra; Heys, Peter N.
Deposition of ZrO2 and HfO2 thin films by liquid injection MOCVD and ALD using ansa-metallocene zirconium and hafnium precursors
Journal of Materials Chemistry, 2008, 18, 4561
7202282 CIFC16 H9 N3 S2P 1 21/n 14.7896; 23.389; 11.493
90; 97.35; 90
1276.9Hong, Wei; Wei, Zhongming; Xi, Hongxia; Xu, Wei; Hu, Wenping; Wang, Quanrui; Zhu, Daoben
6H-Pyrrolo[3,2-b:4,5-b′]bis[1,4]benzothiazines: facilely synthesized semiconductors for organic field-effect transistors
Journal of Materials Chemistry, 2008, 18, 4814
7202384 CIFC2 H5 N9 OP 1 21/c 19.3669; 10.531; 6.8081
90; 90.42; 90
671.6Klapötke, Thomas M.; Mayer, Peter; Stierstorfer, Jörg; Weigand, Jan J.
Bistetrazolylamines—synthesis and characterization
Journal of Materials Chemistry, 2008, 18, 5248
7202385 CIFC4 H11 N9 O2 SC 1 2/c 115.933; 6.8863; 19.9204
90; 104.227; 90
2118.6Klapötke, Thomas M.; Mayer, Peter; Stierstorfer, Jörg; Weigand, Jan J.
Bistetrazolylamines—synthesis and characterization
Journal of Materials Chemistry, 2008, 18, 5248
7202386 CIFC5 H9 N9P 1 21/m 13.852; 19.395; 5.769
90; 95.6; 90
428.9Klapötke, Thomas M.; Mayer, Peter; Stierstorfer, Jörg; Weigand, Jan J.
Bistetrazolylamines—synthesis and characterization
Journal of Materials Chemistry, 2008, 18, 5248
7202387 CIFC4 H7 N9P 1 21/c 110.279; 11.338; 6.772
90; 94.74; 90
786.5Klapötke, Thomas M.; Mayer, Peter; Stierstorfer, Jörg; Weigand, Jan J.
Bistetrazolylamines—synthesis and characterization
Journal of Materials Chemistry, 2008, 18, 5248
7202388 CIFC2 H3 N9P b c a11.109; 9.2272; 21.327
90; 90; 90
2186.1Klapötke, Thomas M.; Mayer, Peter; Stierstorfer, Jörg; Weigand, Jan J.
Bistetrazolylamines—synthesis and characterization
Journal of Materials Chemistry, 2008, 18, 5248
7202399 CIFC3 H10 N10P 21 21 215.6667; 9.4916; 15.9768
90; 90; 90
859.33Tao, Guo-Hong; Guo, Yong; Joo, Young-Hyuk; Twamley, Brendan; Shreeve, Jean'ne M.
Energetic nitrogen-rich salts and ionic liquids: 5-aminotetrazole (AT) as a weak acid
Journal of Materials Chemistry, 2008, 18, 5524

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