Crystallography Open Database

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Searching journal of publication like 'Reviews of Physical Chemistry of Japan'

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1541640 CIFP SiF -4 3 m5.241; 5.241; 5.241
90; 90; 90		143.96Osugi, J.; Namikawa, R.; Tanaka, Y.
Chemical reaction at high temperature and high pressure III. Reaction of Silicon and phosphorus at high temperature and high pressure
Reviews of Physical Chemistry of Japan, 1966, 36, 35-43
1542017 CIFP2 SiP a -35.682; 5.682; 5.682
90; 90; 90		183.444Osugi, J.; Namikawa, R.; Tanaka, Y.
Chemical reaction at high temperature and high pressure III. Reaction of silicon and phosphorus at high temperature and high pressure
Reviews of Physical Chemistry of Japan, 1966, 36, 35-43

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All data in the COD and the database itself are dedicated to the public domain and licensed under the CC0 License . Users of the data should acknowledge the original authors of the structural data.